Ceramic fine-composites by chemical vapor deposition.

Innovative Methods for the Characterization of Ceramic Nanofiltration Membranes Modified by TEOS/O3 Chemical Vapor Deposition

Spatially controllable chemical vapor deposition

Most conventional chemical vapor deposition (CVD) systems do not have the spatial actuation and sensing capabilities necessary to control deposition uniformity, or to intentionally induce nonuniform deposition patterns for single-wafer combinatorial CVD experiments. In an effort to address this limitation, a novel CVD reactor system has been developed that can explicitly control the spatial pro...

Plasmon-assisted chemical vapor deposition.

We introduce a new chemical vapor deposition (CVD) process that can be used to selectively deposit materials of many different types. The technique makes use of the plasmon resonance in nanoscale metal structures to produce the local heating necessary to initiate deposition when illuminated by a focused low-power laser. We demonstrate the technique, which we refer to as plasmon-assisted CVD (PA...

Determination of Optical Properties in Germanium Carbon Coatings Deposited by Plasma Enhanced Chemical Vapor Deposition

In this research, Germanium-carbon coatings were deposited on ZnS substrates by plasma enhanced chemical vapor deposition (PECVD) using GeH4 and CH4 precursors. Optical parameters of the Ge1-xCx coating such as refractive index, Absorption coefficient, extinction coefficient and band gap were measured by the Swanepoel method based on the transmittance spectrum. The results showed that the refra...

Growth of carbon nanostructures upon stainless steel and brass by thermal chemical vapor deposition method

The lack of complete understanding of the substrate effects on carbon nanotubes (CNTs) growth poses a lot oftechnical challenges. Here, we report the direct growth of nanostructures such as the CNTs on stainless steel 304and brass substrates using thermal chemical vapor deposition (TCVD) process with C2H2 gas as carbon sourceand hydrogen as supporting gas mixed in Ar gas flow. We used an especi...